Wednesday, March 27, 2013

1303.6399 (Stephanie M. Moyerman et al.)

High quality superconducting tunnel junction barriers using atomic layer
deposition
   [PDF]

Stephanie M. Moyerman, Guangyuan Feng, Lisa Krayer, Nathan Stebor, Brian G. Keating
We demonstrate a technique for creating high quality, large area tunnel junction barriers for normal-insulating- superconducting or superconducting-insulating-superconducting tunnel junctions. We use atomic layer depo- sition and an aluminum wetting layer to form a nanometer scale insulating barrier on gold films. Electronic transport measurements confirm that single-particle electron tunneling is the dominant transport mechanism, and the measured current-voltage curves demonstrate the viability of using these devices as self-calibrated, low temperature thermometers with a wide range of tunable parameters. The potential for fabricating high performance junction refrigerators is also highlighted.
View original: http://arxiv.org/abs/1303.6399

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